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HOME > PRODUCT > ¿þÀÌÇÁ&¾àÇ°·ù
MERCK / AZ Photoresist
 
 

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Attainable Resist Film Thicknesses

 

 

 

 

AZ 5200E Series.jpg      AZ GXR-600 Series.jpg      AZ P4000 Series.jpg     
   
AZ-8000-01 AZ P4330-RS Positive Resist, Çʸ§ µÎ²²£º3 ¡­ 8 µm, ÆǸŴÜÀ§£º1Ga/bt, Developer£ºAZ 400K(1:4) °ßÀû ¹®ÀÇ
AZ-8000-02 AZ P4620 Positive Resist, Çʸ§ µÎ²²£º6 ¡­ 20 µm, ÆǸŴÜÀ§£º1Ga/bt, Developer£ºAZ 400K(1:4) °ßÀû ¹®ÀÇ
AZ-8000-03 AZ 5206E Posi, Image Reversal Resist, Çʸ§ µÎ²²: 0.5 ¡­ 1.2 µm, ÆǸŴÜÀ§£º1Ga/bt, Developer£ºAZ 300MIF °ßÀû ¹®ÀÇ
AZ-8000-04 AZ 5214E Posi, Image Reversal Resist, Çʸ§ µÎ²²: 1.0 ¡­ 2.0 µm, ÆǸŴÜÀ§£º1Ga/bt, Developer£ºAZ 300MIF °ßÀû ¹®ÀÇ
AZ-8000-05 AZ 9260(520CP) Positive Resist, Çʸ§ µÎ²²£º5 ¡­ 20µm, ÆǸŴÜÀ§£º1Ga/bt, Developer£ºAZ 400K(1:4) °ßÀû ¹®ÀÇ
AZ-8000-06 AZ GXR-601-14CP Positive Resist, Çʸ§ µÎ²²£º1§­¡­1.8§­, ÆǸŴÜÀ§£º1Ga/bt, Developer£ºAZ 300MIF °ßÀû ¹®ÀÇ
AZ-8000-07 AZ GXR-601-46CP Positive Resist, Çʸ§ µÎ²²£º1.5§­¡­3.4§­, ÆǸŴÜÀ§£º1Ga/bt, Developer£ºAZ 300MIF °ßÀû ¹®ÀÇ
AZ-8000-08 AZ 1512 Resist, Çʸ§ µÎ²²£º1.5~3.0§­, ÆǸŴÜÀ§£º1Ga/bt, Developer : AZ 300MIF 0(VATº°µµ)
AZ-8100-21 AZ nLOF2035 Negative Resist, Çʸ§ µÎ²²£º3.5 µm, ÆǸŴÜÀ§£º1Ga/bt °ßÀû ¹®ÀÇ
AZ-8100-22 AZ nLOF2070 Negative Resist, Çʸ§ µÎ²²£º10 µm, ÆǸŴÜÀ§£º1Ga/bt °ßÀû ¹®ÀÇ
MERCK / AD Thinner
 
 

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¢¹Solvent for dilution of photoresist
¢¹Suitable for dilution of photoresist and washing of wafers and coater-cup.
¢¹In casebof non-bake, it  is possible to use as Remover.

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¢¹Æ÷Àå´ÜÀ§ : 4L/bottle


 

 

 

   
AZ-8500-01 AZ 1500 ÆǸŴÜÀ§£º4L, À¯È¿±â°££º1³â °ßÀû ¹®ÀÇ
MERCK / AZ Developer
 
 

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AZ-8100-01 AZ 300MIF Ç°¸í£ºAZ 300MIF, ÆǸŴÜÀ§£º20L/bt, À¯È¿±â°££º1³â °ßÀû ¹®ÀÇ
AZ-8100-02 AZ 500MIF 0(VATº°µµ)
AZ-8100-03 AZ 400K Ç°¸í£ºAZ 400K(1:4), ÆǸŴÜÀ§£º20L/bt, À¯È¿±â°££º1³â °ßÀû ¹®ÀÇ
AZ-8100-04 AZ DEV CD30 Ç°¸í£ºAZ DEV CD30, ÆǸŴÜÀ§£ºGa/bt, À¯È¿±â°££º1³â °ßÀû ¹®ÀÇ
AZ-8100-05 AZ 340 Ç°¸í£ºAZ 340, ÆǸŴÜÀ§£ºGa/bt, À¯È¿±â°££º1³â °ßÀû ¹®ÀÇ
MICROCHEM / Copolymer
 
 

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¢¹Facilitdmixture of fluorinated additives

¢¹100% organic thermoplast ¡æ dry etching and stripping possible with pure oxygen plasma

¢¹Polymer soluble in aceton and other common solvents ¡æ easy cleaning

 

 

 

 

 

 

 



 

   
MC-440-01 mr-I 7010R Polymer mr-I 7010R, ¿ë·®£º250ml/bottle °ßÀû ¹®ÀÇ
MC-440-02 mr-I 7020R Polymer mr-I 7020R, ¿ë·®£º250ml/bottle °ßÀû ¹®ÀÇ
MC-440-03 mr-I 7030R Polymer mr-I 7030R, ¿ë·®£º250ml/bottle °ßÀû ¹®ÀÇ
MICROCHEM / Copolymer
 
 

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¢¹E-beam, X-ray & deep UV imaging
¢¹Çʸ§ÀÇ µÎ²²´Â ÆøÀÌ ³Ð½À´Ï´Ù.
¢¹´ëºÎºÐÀÇ ±âÁú¿¡ ¶Ù¾î³­ Á¢Âø·ÂÀ» º¸ÀÔ´Ï´Ù.

¢¹´Ù¾çÇÑ Á¾·ùÀÇ ºÐÀÚ·®°ú Èñ¼®

¢¹´ÙÁß °èÃþÀÇ ÇÁ·Î¼¼½º¿Í ȣȯÀÌ °¡´ÉÇÕ´Ï´Ù.

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¢¹ 500ml/bottle or 1L/bottle

 

   
MC-Copolymer-11 MMA(8.5)MAAEL6 MMA(8.5)MAAEL6, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
MC-Copolymer-12 MMA(8.5)MAAEL7 MMA(8.5)MAAEL7, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
MC-Copolymer-13 MMA(8.5)MAAEL8 MMA(8.5)MAAEL8, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
MC-Copolymer-14 MMA(8.5)MAAEL9 MMA(8.5)MAAEL9, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
MC-Copolymer-15 MMA(8.5)MAAEL10 MMA(8.5)MAAEL10, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
MC-Copolymer-16 MMA(8.5)MAAEL11 MMA(8.5)MAAEL11, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
MC-Copolymer-17 MMA(8.5)MAAEL12 MMA(8.5)MAAEL12, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
MC-Copolymer-18 MMA(8.5)MAAEL13 MMA(8.5)MAAEL13, ¿ë·®£º500ml/bottle °ßÀû ¹®ÀÇ
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