◆사양 ▷Appearance : Clear colorless liquid ▷Oddor : Amine ▷Boiling Point : 100 ºC (212 ºF) ▷Specific Gravity : 1.00 ▷Vapor Pressure : Data not available ▷Vapor Densitty: Data not available ▷H2O Solubility : 100% @ 20 ºC, by wt. ▷% Volatiles : <1% by wt ▷Evaporation Rate : Slower than ether ▷Flash Point : Nonflammable ▷Autoignition Temp. : Not Determined
MC-660-01
101 A Developer
101 Developer, 용량：4L/Bottle
견적 문의
MICROCHEM / Developer(MIBK)
◆특징 ▷PMMA와 Copolymer Resist에 최적화 되어있습니다.
▷E-beam lithography 공정용 developer
▷Spray와 Immersion Processes로 사용 가능합니다. ▷sub 0.1㎛ resolution
◆사양 ▷ 4L/bt or 4Lbt x 4/1Box
MC-MIBK-11
MIBK
MIBK, 용량：4Lx4bt/Box
견적 문의
MC-MIBK-12
MIBK:IPA 1:1
MIBK:IPA/1:1, 용량：4Lx4bt/Box
견적 문의
MC-MIBK-13
MIBK:IPA 1:2
MIBK:IPA/1:2, 용량：4Lx4bt/Box
견적 문의
MC-MIBK-14
MIBK:IPA 1:3
MIBK:IPA/1:3, 용량：4Lx4bt/Box
견적 문의
MICROCHEM / Omnicoat Resist
◆특징 ▷Easy, fast, clean & safe removal ▷Uses existing strippers and processe ▷Uses a very thin coating ▷Adhesion Promoter
▷Allows easy stripping of hard to remove photoresists and other materials plus improved adhesion ▷Improves adhesion to difficult substrates like Au, Cu and Qua
▷실리콘, Ni., GaA, InP 및 많은 다른 III-V물질에 대한 뛰어난 접착력을 보입니다.
▷높은 열에 안정성을 보입니다. ( ~190 C)
▷기존의 Conventional Resist Stripper을 빠르고 깔끔하게 제거합니다.
▷높은 산출, 매우 두꺼운(>3µm)금속 리프트 오프 처리를 가능하게 합니다.
▷Sub 0.25μm lift-off processing.
MC-PMGI-11
PMGI SFG2
PMGI SFG2, 용량 : 500ml/bottle
견적 문의
MC-PMGI-12
PMGI SF3
PMGI SF3, 용량 : 500ml/bottle
견적 문의
MC-PMGI-13
PMGI SF4
PMGI SF4, 용량 : 500ml/bottle
견적 문의
MC-PMGI-14
PMGI SF5
PMGI SF5, 용량 : 500ml/bottle
견적 문의
MC-PMGI-15
PMGI SF6
PMGI SF6, 용량 : 500ml/bottle
견적 문의
MC-PMGI-16
PMGI SF7
PMGI SF7, 용량 : 500ml/bottle
견적 문의
MC-PMGI-17
PMGI SF8
PMGI SF8, 용량 : 500ml/bottle
견적 문의
MC-PMGI-18
PMGI SF9
PMGI SF9, 용량 : 500ml/bottle
견적 문의
MC-PMGI-19
PMGI SF10
PMGI SF10, 용량 : 500ml/bottle
견적 문의
MC-PMGI-20
PMGI SF11
PMGI SF11, 용량 : 500ml/bottle
견적 문의
MC-PMGI-21
PMGI SF12
PMGI SF12, 용량 : 500ml/bottle
견적 문의
MC-PMGI-22
PMGI SF13
PMGI SF13, 용량 : 500ml/bottle
견적 문의
MICROCHEM / PMMA
◆특징 ▷PMMA (polymethyl methacrylate) is a versatile polymeric material that is well suited for many imaging and non-imaging microelectronic applications.
▷Most commonly used as a high resolution positive resist for direct write e-beam as well as x-ray and deep UV microlithographic processes.
▷Also used as a protective coating for wafer thinning, as a bonding adhesive and as a sacrificial layer. ▷Standard PMMA products cover a wide range of film thicknesses and are formulated with 495,000 & 950,000 molecular weight (MW) resins in either chlorobenzene or the safer solvent anisole.
◆사양
▷All MCC PMMA resists are available in package sizes from 500ml to 20 liters.
MICROCHEM / Developer
