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ZEON / E-Beam Lithography Resist
 
 

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¢¹High resolution (sub-10-nm)

¢¹Excellent etch resistance – dry and wet etch

¢¹High sensitivity

¢¹Strong adhesion to most substrates

¢¹Thermal stability

¢¹High contrast

¢¹High aspect ratio

¢¹Processing stability

¢¹No post exposure bake

¢¹​Shipping and storage at room temperature

¢¹Post coat delay

¢¹Post exposure delay

 


 

 

   
Z0-1001-01 ZEP520A Viscosity : 11mPa/s, 100ml/bottle °ßÀû ¹®ÀÇ
ZO-1001-02 ZEP530A Viscosity : 6cp, Volume : 1qt/bottle 32,700,000(VATº°µµ)
ZO-2001-11 ZED-N50 Developer, High sensitivity, Volume : 1ga/bottle 800,000(VATº°µµ)
ZO-2001-12 ZED-N60 Developer, High sensitivity, 1ga/bottle 800,000(VATº°µµ)
11.12.13