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DOW / Photo-Sensitive Polyimide
 
 

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PI-2111-01 PI-510 Wet etch type, °æÈ­¿Âµµ£º250¡­300¡É, ÃÖ¼ÒÁÖ¹®·®£º1L 3,300,000(VATº°µµ)
PI-2112-11 PI-520 Negative type, °æÈ­¿Âµµ£º250¡­300¡É, ÃÖ¼ÒÁÖ¹®·®£º1L 3,300,000(VATº°µµ)
PI-2113-21 PI-530 Negative type, °æÈ­¿Âµµ£º180¡­250¡É, ÃÖ¼ÒÁÖ¹®·®£º1L 3,300,000(VATº°µµ)
PI-2114-31 PI-540 Positive type, °æÈ­¿Âµµ£º250¡­300¡É, ÃÖ¼ÒÁÖ¹®·®£º1L 3,300,000(VATº°µµ)
DUPONT / EKC
 
 

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¢¹ ÀϹÝÀûÀÎ Æ÷Åä·¹Áö½ºÆ® Á¦°Å¿ë ½À½Ä ¼¼Á¤Á¦ÀÇ Á¦Ç°

¢¹ Aminoethoxy ethanol + N-methyl pyrrolidine

¢¹ ¾Æ¼¼Åæ, ½Ç¸®ÄÜ ¸®¹«¹ö(Si Remover) µî°ú °°Àº À¯±â(Organic) ¼¼Á¤Á¦¸¦ »ç¿ëÇÒ ¼ö ÀÖ´Ù.

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¢¹ Positive PR ¸®¹«¹ö 

   
DP-3300-01 EKC800 Æ÷Àå´ÜÀ§ : 4kg/bottle °ßÀû ¹®ÀÇ
DP-3300-02 EKC830 Æ÷Àå´ÜÀ§ : Ga/bt °ßÀû ¹®ÀÇ
DP-3300-03 EKC830(´ë) Æ÷Àå´ÜÀ§ : 19L °ßÀû ¹®ÀÇ
DUPONT / Photoresist
 
 

¡ßDescription

¢¹MICROPOSIT S1800 G2 Series Photoresists are positive photoresist systems engineered

to satisfy the microelectronics industry¡¯s requirements for advanced IC device fabrication.

The system has been engineered using a toxicologically-safer alternative casting solvent to

the ethylene glycol derived ether acetates. The dyed photoresist versions are recommended

to minimize notching and maintain linewidth control when processing on highly reflective

substrates.​

 

S1800-G2.pdf     
   
DR-S1318-1 S1813 G2 MICROPOSIT¢â S1813¢â G2 / 1.3 µm @ 4000 rpm 1gal/bt °ßÀû ¹®ÀÇ
ETCHANT / Al Etchant
 
 

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¢¹Al, AL+Cu Alloy µîÀ» ½Ä°¢Çϱâ À§ÇÏ¿© °í¾ÈµÈ Á¦Ç°
¢¹³·Àº Particle Level (0.1§­ Filtering)

¢¹SPC Controlled Manufacturing

 


 

 

 

 

   
LZ-4404-31 APAL-1 Al Etchant, Æ÷Àå´ÜÀ§£ºGa, ÃÖ¼Ò ÆǸŠ´ÜÀ§£º4Ga/box, À¯È¿±â°££º1³â °ßÀû ¹®ÀÇ
ETCHANT / Ni-Ag Etchant
 
 

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¢¹TFT-LCD ¹× Display panelÀÇ metal ¹è¼±À» Çü¼ºÇϴµ¥ Àû¿ëµÇ´Â Chemical ÀÔ´Ï´Ù.

¢¹Source and Drain, Gate, PixelÀÇ ´Ù¾çÇÑ ±Ý¼Ó¹è¼±¿¡ Àû¿ëµÇ¸ç Pattern¿¡ »ç¿ëµÇ´Â ´Ù¾çÇÑ MetalÀÇ Á¾·ù¿¡ ÀûÇÕÇÑ Etchant ÀÔ´Ï´Ù. 

   
LZ-4404-41 EMO-410 Ni-Ag Etchant. Æ÷Àå´ÜÀ§£ºGa, ÃÖ¼Ò ÆǸŠ´ÜÀ§£º4Ga/box, À¯È¿±â°££º1³â °ßÀû ¹®ÀÇ
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