◆특징
▷ 일반적인 포토레지스트 제거용 습식 세정제의 제품

▷ Aminoethoxy ethanol + N-methyl pyrrolidine

▷ 아세톤, 실리콘 리무버(Si Remover) 등과 같은 유기(Organic) 세정제를 사용할 수 있다.

◆사양
▷ Positive PR 리무버 

◆Description​​

▷MICROPOSIT S1800 G2 Series Photoresists are positive photoresist systems engineered

to satisfy the microelectronics industry’s requirements for advanced IC device fabrication.

The system has been engineered using a toxicologically-safer alternative casting solvent to

the ethylene glycol derived ether acetates. The dyed photoresist versions are recommended

to minimize notching and maintain linewidth control when processing on highly reflective

substrates.​

◆특징

▷SPC Controlled Manufacturing​

◆특징

▷Source and Drain, Gate, Pixel의 다양한 금속배선에 적용되며 Pattern에 사용되는 다양한 Metal의 종류에 적합한 Etchant 입니다. 

◆특징

▷Secco Etchant is conventionally used for delineation of flow pattern defects (FPDs) in lightly-doped Czochralski (Cz) silicon wafers.

◆사양